Carbon for electronic applications
Product Description:
This product is primarily used for high-purity purification in the electronics industry; it is characterized by a rapid adsorption rate, high adsorption capacity, and superior chemical purity.
Raw material: Must be coconut shell-based activated carbon (coal-based activated carbon has a high ash content and is prone to releasing heavy metals; it must absolutely not be used).
1) Standard electronic-grade purified water (for PCBs, electroplating, and laboratory DI water)
Acid-washed coconut shell activated carbon; removes residual chlorine and TOC; offers the best cost-performance ratio.
2) Semiconductor wafer/chip manufacturing (Ultra-Pure Water, or UPW)
High-purity, acid-washed carbon with low leachable content; strictly controls TOC leaching; comes with SEMI F57-compliant test reports. Catalytic carbon is also available for the highly efficient removal of chloramines.
Specification：
| Project | Index | |
| Particle size 8–18 mesh 10–24 mesh | % | ≥95 |
| Iodine value | mg/g | ≥900-1000 |
| Intensity | % | ≥98 |
| Water content | % | ≤10 |
| Ash content | % | ≤5 |
| Apparent density | % | 0.40-0.45 |
| PH value | g/l | 6-8 |
Application：
Pretreatment for ultrapure water systems in semiconductor, PCB, electroplating, and laboratory applications (using activated carbon vessels as a first stage) to protect RO membranes and EDI resins, and to prevent organic matter and residual chlorine from oxidizing membrane elements.
Differences from standard water-purification carbon
- Standard water-purification carbon: Water-washed only; characterized by high ash content and a tendency for metals to leach out—suitable only for tap water treatment.
- High-purity carbon for electronic-grade water: Subjected to acid-washing/purification and intensive water-washing; features low ash content, minimal metal leaching, and low total organic carbon (TOC) release, ensuring stable water quality for ultrapure water applications.
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